Introduction & Context
Ohmic heating is an advanced thermal processing technique where electrical current is passed directly through a food product, utilizing its internal electrical resistance to generate heat volumetrically. Unlike conventional heat exchangers that rely on conductive or convective heat transfer from a surface, ohmic heating allows for rapid, uniform temperature increases, particularly in particulate-liquid mixtures.
In Process Engineering, calculating the lethality (F0) is critical to ensure food safety and regulatory compliance. Because ohmic heating provides a rapid come-up time, the lethality accumulated during the heating phase is significant and cannot be ignored. This calculation is used to determine the total microbial destruction achieved during both the dynamic heating phase and the subsequent isothermal holding phase, ensuring the process meets the required sterilization targets for pathogens such as Clostridium botulinum.
Methodology & Formulas
The total lethality of the process is the sum of the lethality accumulated during the heating phase (F0,heat) and the holding phase (F0,hold). The calculation assumes a linear temperature rise during the ohmic heating period.
The instantaneous lethality rate L(t) at any temperature T is defined as:
\[ L(t) = 10^{\frac{T(t) - T_{\mathrm{ref}}}{z}} \]For the heating phase, where temperature increases linearly from T0 to Tf over time th, the integrated lethality is calculated as:
\[ F_{0,\mathrm{heat}} = \frac{z}{\ln(10)} \cdot \frac{t_h}{T_f - T_0} \left( 10^{\frac{T_f - T_{\mathrm{ref}}}{z}} - 10^{\frac{T_0 - T_{\mathrm{ref}}}{z}} \right) \]For the holding phase, where the product is maintained at a constant temperature Tf for duration thold, the lethality is:
\[ F_{0,\mathrm{hold}} = t_{\mathrm{hold}} \cdot 10^{\frac{T_f - T_{\mathrm{ref}}}{z}} \]The total process lethality is the summation of these two components:
\[ F_0 = F_{0,\mathrm{heat}} + F_{0,\mathrm{hold}} \]| Parameter | Description | Typical Empirical Range |
|---|---|---|
| z | Temperature sensitivity coefficient | 7.0 – 12.0 °C |
| th | Heating residence time | 5.0 – 15.0 s |
| Tf | Target sterilization temperature | < 140.0 °C (Equipment limit) |
| Tref | Reference temperature | 121.1 °C |